本計畫期中執行進度：第一季與第二季在電弧電漿技術方面，以金屬鋯作為電弧

本計畫期中執行進度：第一季與第二季在電弧電漿技術方面，以金屬鋯作為電弧電漿靶材，再搭配氧化鑭與氧化鋰作為直流磁控濺鍍靶材，進行Li6.4La3Zr1.4Ta0.6O12 (LLTZO)共鍍方式製作固態電解質，其鍍膜必要條件為靶材必須達到電阻率皆小於100 方可引弧，有別於傳統上只能用射頻濺鍍(Radio Frequency Sputtering, RF)製作非導電靶材。最新實驗數據顯示以共鍍法製備之LLTZO電解質，可得到最佳值為離子導電率，可達1.8310-4 (S/cm)，其鍍膜速率達17 nm/min。

結果 (英文) 1:

The interim implementation progress of this plan: In terms of arc plasma technology in the first and second quarters, metal zirconium is used as the arc plasma target, and lanthanum oxide and lithium oxide are used as DC magnetron sputtering targets to conduct Li6. 4La3Zr1.4Ta0.6O12 (LLTZO) co-plating method is used to produce solid electrolyte. The necessary condition for the coating is that the target must have a resistivity of less than 100  before arc can be struck. This is different from the traditional radio frequency sputtering (Radio Frequency Sputtering). , RF) to produce non-conductive targets. The latest experimental data shows that LLTZO electrolyte prepared by co-plating method can obtain the best ionic conductivity, which can reach 1.83×10-4 (S/cm), and its coating rate can reach 17 nm/min.

結果 (英文) 2:

Mid term execution progress of this plan: In the first and second seasons, in terms of arc plasma technology, metal zirconium is used as the arc plasma target material, followed by lanthanum oxide and lithium oxide as the DC magnetron sputtering target material, and Li6.4La3Zr1.4Ta0.6O12 (LLTZO) co plating method is used to produce solid-state electrolyte. The necessary condition for the coating is that the target material must achieve a resistivity of less than 100 Ω before arc ignition, Unlike traditional methods where non-conductive targets can only be made using Radio Frequency Sputtering (RF). The latest experimental data shows that the LLTZO electrolyte prepared by co plating method can obtain the optimal value of ion conductivity, which can reach 1.83 × 10-4 (S/cm), and its coating rate can reach 17 nm/min.

結果 (英文) 3:

Implementation progress in this project: In the first and second quarters, in terms of arc plasma technology, metallic zirconium was used as arc plasma target, and lanthanum oxide and lithium oxide were used as DC magnetron sputtering targets, and Li6.4La3Zr1.4Ta0.6O12 (LLTZO) co-plating method was used to produce solid electrolyte. The necessary condition for coating was that the resistivity of the target must be less than 100 before arcing, which was different from the traditional method of radio frequency sputtering. The latest experimental data show that the best value of LLTZO electrolyte prepared by co-plating method is ionic conductivity, which can reach 1.8310-4 (s/cm), and its coating rate can reach 17 nm/min.